Media & Culture

Daniel Moreno-Gama is facing federal charges for attacking Sam Altman’s home and OpenAI’s HQ

Suspect arrested with 'Your Last Warning' manifesto advocating violence against AI executives.

Deep Dive

Federal prosecutors have unsealed charges against Daniel Moreno-Gama, a Texas man accused of a violent, premeditated attack targeting OpenAI CEO Sam Altman and the company's San Francisco headquarters. According to the Department of Justice complaint, Moreno-Gama traveled to California with the specific intent to kill Altman. On April 10, 2026, he allegedly threw a Molotov cocktail at Altman's residence before proceeding to OpenAI's offices, where he attempted to smash the glass doors with a chair, stating he intended to "burn down the location and kill anyone inside." He was arrested at the scene.

Authorities recovered a trove of evidence, including incendiary devices, a jug of kerosene, a lighter, and an unregistered firearm. Most critically, police found a three-part document authored by Moreno-Gama titled 'Your Last Warning.' In it, he explicitly admitted to having 'killed/attempted to kill' Altman (referred to as Victim-1) and advocated for others to commit similar crimes against CEOs of AI companies and their investors. The manifesto, which he also emailed to contacts at his former college, outlined his opposition to AI development, which he framed as an existential risk, and contained a list of names and addresses of other AI industry leaders.

Key Points
  • Daniel Moreno-Gama faces federal charges including attempted destruction of property by explosives, carrying a maximum 20-year sentence.
  • The attack occurred on April 10, 2026, targeting both Sam Altman's private home and OpenAI's San Francisco headquarters.
  • Police evidence includes a 'Your Last Warning' manifesto where Moreno-Gama admitted to the attempt and listed other AI executives as targets.

Why It Matters

This incident marks a severe escalation in real-world threats against AI leaders, highlighting intense societal friction around rapid technological advancement.